CUTE is Femtoscience Inc.’s compact and reliable table-top sized vacuum plasma system that provides effective solutions to various surface treatment needs. (Sample Size: 4-inch wafer)

Key Features:

• Plasma Etching (Neutral Domination)
• Single Block Aluminum Chamber 140 × 200 × 110 mm (W×D×H)
• Uniform Gas Flow Inside the chamber (Patent No. 10-1697205)
• LF Generator (Frequency: 20~100kHz / Power: Max.100W)
• Mass Flow Controller (Max. 100sccm / up to 3 channels)
• System Geometry: 440 × 500 × 560 mm (W×D×H)

 

Applications:

• Microfluidics Research (PDMS Chip Fabrication)
• Hydrophilic / Hydrophobic Treatment
• Food Science Research
• Cleaning & Sterilization

Chemical & New Materials Research