COWIN is a customized vacuum plasma system that fulfills a various surface treatment and etching requirements from the customer. Its large sized chamber allows batch processing of the substrates.

Key Features:

• Dual Mode: RIE (Ion Domination) & PE (Neutral Domination)

Single Mode: PE (Neutral Domination)

• Horizontal Type Chamber 330 × 350 × 340 mm (W×D×H)

Single / Double / Multi Electrode

• Uniform Gas Flow Inside the chamber (Patent No. 10-1697205)
• LF Generator (Frequency: 20~100kHz / Power: Max.300W)

RF Generator (Frequency: 13.56MHz / Power: Max.300W)

• Mass Flow Controller (Max. 500sccm / up to 4 channels)
• System Geometry: 800 × 800 × 1800 mm (W×D×H)

 

Applications:

• Semiconductor Research
• Polymer Etching
• 2D Materials
• Micro-electromechanical Systems
• Bio & Life science

Chemical & Material Engineering