AETP builds vacuum plasma with special sources upon customer request.
We provide Vacuum Plasma from general purpose type using air to 2.45Ghz microwave source type.

We also provide the best optimized design for manufacturing. Applications include surface treatment, etching and coating. Vacuum Plasma covers products that cannot be processed by air plasma and flame plasma.

· Plasma source options
 Radio frequency Type: 13.56Mhz
 Microwave Type: 2.45Ghz
· Plasma power control: 200W~1000W
· MFC channel: 2 channels (optional)
· Size of chamber: 125ℓ (size varies by a custom order)
· Turntable (optional)